Compression layer on the lead frame to reduce stress defects

ABSTRACT

An LOC die assembly includes a die dielectrically adhered to the underside of a lead frame. The active surface of the die underlying the attached lead frame is coated with a polymeric material such as polyimide. The underside of the lead frame overlying the die is coated with a layer of soft material, such as silver, which has a lower hardness than the coating on the active surface for absorbing point stresses. Penetration of stacked filler particles into the soft material reduces point stresses on the active die surface and disadhesion stresses on the lead frame components.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of application Ser. No. 09/699,918,filed Oct. 30, 2000, now U.S. Pat. No. 6,486,539, issued Nov. 26, 2002,which is a continuation of application Ser. No. 09/298,301, filed Apr.23, 1999, now U.S. Pat. No. 6,140,695, issued Oct. 31, 2000, which is acontinuation of application Ser. No. 08/857,200, filed May 15, 1997, nowU.S. Pat. No. 5,923,081, issued Jul. 13, 1999.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates generally to the fabrication of semiconductordevices such as a “leads-over-chip” (LOC) die assembly. Morespecifically, the invention pertains to a method and apparatus forreducing the stress resulting from the lodging of filler particlespresent in plastic encapsulants between the undersides of the lead frameleads and the active surface of the die, an integrated circuitsemiconductor device, in a die assembly encapsulated in plastic.

2. State of the Art

The use of LOC semiconductor die assemblies has become relatively commonin the industry. This style or configuration of semiconductor devicereplaces a “traditional” lead frame with a central, integral support(commonly called a die-attach tab, paddle or island) to which the backsurface of a semiconductor die is secured, with a lead frame arrangementwherein the dedicated die-attach support is eliminated and at least someof the leads extend over the active surface of the die. The die is thenadhered to the lead extensions with an adhesive dielectric layer of somesort disposed between the undersides of the lead extensions and the die.Early examples of LOC assemblies are illustrated in U.S. Pat. No.4,862,245 to Pashby et al. and U.S. Pat. No. 4,984,059 to Kubota et al.More recent examples of the implementation of LOC technology aredisclosed in U.S. Pat. Nos. 5,068,712; 5,184,208; 5,233,220; 5,252,853;5,227,661; 5,286,679; 5,304,842; 5,418,189; 5,461,255; 5,466,888;5,545,921; and 5,576,246. In instances known to the inventors, LOCassemblies employ large quantities or horizontal cross-sectional areasof adhesive to enhance physical support of the die for handling.

Traditional lead frame die assemblies using a die-attach tab place theinner ends of the lead frame leads in close lateral proximity to theperiphery of the active die surface where the bond pads are located,wire bonds then being formed between the lead ends and the bond pads.LOC die assemblies, by their extension of inner lead ends over the die,permit physical support of the die from the leads themselves as well asmore diverse (including centralized) placement of the bond pads on theactive surface, as well as the use of the leads for heat transfer fromthe die.

However, use of LOC die assemblies in combination with plastic packagingof the LOC die assembly, as known in the art, has demonstrated someshortcomings of LOC technology as presently practiced in the art.

By far the most common manner of forming a plastic package about a dieassembly is molding, and specifically transfer molding. In this process(and with specific reference to LOC die assemblies), a semiconductor dieis suspended by its active surface from the underside of inner leadextensions of a lead frame (typically Cu or Alloy 42) by a tape, screenprint or spin-on dielectric adhesive layer. The bond pads of the die andthe inner lead ends of the frame are then electrically connected by wirebonds (typically Au, although Al and other metal alloy wires have alsobeen employed) by means known in the art. The resulting LOC dieassembly, which may comprise the framework of a dual-in-line package(DIP), zig-zag in-line package (ZIP), small outline j-lead package(SOJ), quad flat pack (QFP), plastic leaded chip carrier (PLCC), surfacemount device (SMD) or other plastic package configuration known in theart, is placed in a mold cavity and encapsulated in a thermosettingpolymer which, when heated, reacts irreversibly to form a highlycross-linked matrix no longer capable of being re-melted.

The thermosetting polymer generally is comprised of three majorcomponents: an epoxy resin, a hardener including accelerators, and afiller material. Other additives such as flame retardants, mold releaseagents and colorants are also employed in relatively small amounts.While many variations of the three major components are known in theart, the focus of the present invention resides in the filler materialsemployed in the thermosetting polymer and their effects on the activedie surface.

Filler materials are usually a form of fused silica, although othermaterials such as calcium carbonates, calcium silicates, talc, mica andclays have been employed for less rigorous applications. Powdered fusedquartz is currently the primary filler used in encapsulants. Each of theabove filler materials is a relatively hard material, particularly whencompared to the die surface.

Fillers provide a number of advantages in comparison to unfilledencapsulants. For example, fillers reinforce the polymer and thusprovide additional package strength, enhance thermal conductivity of thepackage, provide enhanced resistance to thermal shock, and greatlyreduce the cost of the encapsulating material in comparison to unfilledpolymer. Fillers also beneficially reduce the coefficient of thermalexpansion (CTE) of the composite material by about fifty percent incomparison to the unfilled polymer, resulting in a CTE much closer tothat of the silicon or gallium arsenide die. Filler materials, however,also present some recognized disadvantages, including increasing thestiffness of the plastic package and the moisture permeability of thepackage.

One previously unrecognized disadvantage discovered by the inventorsherein is damage to the active die surface resulting from encapsulantfiller particles becoming lodged or wedged between the underside of thelead extensions and the active die surface during transfer molding ofthe plastic package about the die and the inner lead ends of the LOC dieassembly. The filler particles, which may literally be jammed inposition due to deleterious polymer flow patterns and flow imbalances inthe mold cavity during encapsulation, place the active die surface underresidual stress at the points of contact of the particles. The hardparticles may then damage the die surface or conductive elements thereonor immediately thereunder when the package is further stressed(mechanically, thermally, electrically) during post-encapsulationhandling and testing.

While it is possible to employ a lower volume of filler in theencapsulating polymer to reduce potential for filler particle lodging orwedging, a drastic reduction in filler volume raises costs of thepolymer to unacceptable levels. Currently available filler technologyalso imposes certain limitations as to practical beneficial reductionsin particle size (currently in the 75 to 125 micron range, with thelarger end of the range being easier to achieve with consistency) and inthe shape of the filler particles. While it is desirable that particlesbe of generally spherical shape, it has thus far proven impossible toeliminate non-spherical flakes or chips which, in the wrong orientation,maximize stress on the die surface.

Ongoing advances in design and manufacturing technology provideincreasingly thinner conductive, semiconductive and dielectric layers instate-of-the-art dice, and the width and pitch of conductors servingvarious purposes on the active surface of the die are likewise beingcontinually reduced. The resulting die structures, while robust andreliable for their intended uses, nonetheless become morestress-susceptible due to the minimal strength provided by the minutewidths, depths and spacings of their constituent elements. The integrityof active surface die coats such as silicon dioxide, doped silicondioxides such as phosphorous silicate glass (PSG) or borophosphoroussilicate glass (BPSG), or silicon nitride, may thus be compromised bypoint stresses applied by filler particles, the result beingunanticipated shortening of device life if not immediate, detectabledamage or alteration of performance characteristics.

The aforementioned U.S. Pat. No. 4,984,059 to Kubota et al. doesincidentally disclose several exemplary LOC arrangements which appear togreatly space the leads over the chip or which do not appear to providesignificant areas for filler particle lodging. However, such structuresmay create fabrication and lead spacing and positioning difficulties.

U.S. Pat. No. 5,436,410 to Jain et al. discloses methods for suppressingstress-induced defects in semiconductor leads. The specific problemsaddressed by Jain et al. do not include damage to the die by fillermaterial particles, and their solution to lead damage is to provide astress-reducing layer over the leads.

To the inventor's knowledge, those of ordinary skill in the art havefailed to recognize the particular stress phenomenon attendant totransfer molding and the use of filled encapsulants, nor has the currentstate of the art provided a LOC structure which beneficiallyaccommodates this phenomenon.

BRIEF SUMMARY OF THE INVENTION

The present invention provides a lead-supported die assembly for a LOCarrangement that substantially reduces the stress that may otherwisepotentially form between the leads and the active die surface due to thepresence of filler particles of the polymer encapsulant.

A layer of relatively soft material, i.e., less hard than the die activesurface or its covering, is adhered to the underside of the leadsoverlying peripheral portions of the die. Filler particles in theencapsulant which may become stacked between portions of the die and theoverlying lead portions preferentially penetrate the soft layer on thelead portions, thus protecting the die surface from damage.

The soft material may be a soft metal such as essentially pure silver orother relatively inert metal, or an alloy thereof. The soft materialmust be inert to avoid detrimental chemical reactions with otherchemical species after encapsulation.

Alternatively, the soft material may be a polymer designed to have a lowhardness, at least during the encapsulation process. The polymericmaterial hardness prior to encapsulation is less than about one-half thehardness of the die or any coating thereon. The polymer may subsequentlyharden, but has served its purpose in absorbing forces exerted by fillerparticles during encapsulation. The preferential penetration of fillerparticles into the soft material layer protects the die surface fromdamage.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The invention is illustrated in the following figures, wherein theelements are not necessarily shown to scale:

FIG. 1 is a flow chart of an exemplary process sequence for plasticpackage molding of the prior art;

FIG. 2A is a schematic side view of a typical transfer molding of theprior art, showing a pre-molding encapsulant position;

FIG. 2B is a schematic side view of a typical transfer molding of theprior art, showing a post-molding encapsulant position;

FIG. 3 is a schematic plan view of one side of a transfer mold of FIGS.2A and 2B, depicting encapsulant flow and venting of the primary moldrunner and the mold cavities in which the die assemblies are contained;

FIG. 4A is a schematic side view of a transfer mold of the prior art,depicting encapsulant flow about a die assembly;

FIG. 4B is a schematic side view of a transfer mold of the prior art,depicting encapsulant flow about a die assembly wherein wire bonds aresubjected to “wire sweep”;

FIG. 4C is an enlarged schematic top view of a transfer mold of theprior art, depicting the progressive encapsulant flow about a dieassembly;

FIG. 5A is a cross-sectional side view of a prior art packaged SOJsemiconductor device;

FIG. 5B is an enlarged cross-sectional side view of a prior art packagedSOJ semiconductor device;

FIG. 6A is a cross-sectional side view of a packaged SOJ semiconductordevice of the invention;

FIG. 6B is an enlarged cross-sectional side view of the packaged SOJsemiconductor device of FIG. 6A;

FIG. 7A is a cross-sectional side view of another embodiment of apackaged SOJ semiconductor device of the invention;

FIG. 7B is an enlarged cross-sectional side view of the packaged SOJsemiconductor device of FIG. 7A;

FIG. 8 is a plan view of a die-lead frame assembly of a semiconductordevice of the invention; and

FIG. 9 is a plan view of another embodiment of a die-lead frame assemblyof a semiconductor device of the invention.

DETAILED DESCRIPTION OF THE INVENTION

So that the reader may more fully understand the present invention inthe context of the prior art, it seems appropriate to provide a briefdescription of a transfer apparatus and method for forming a plasticpackage about a leads-over-chip (LOC) die assembly. The term “transfer”molding is descriptive of this process as the molding compound(encapsulant), once melted, is transferred under pressure to a pluralityof remotely located mold cavities containing die assemblies to beencapsulated.

FIG. 1 depicts the typical process sequence for plastic package molding.It should be noted that the solder dip/plate operation has been shown asone step for brevity; normally, coating would occur prior to the “trimand form” step.

FIGS. 2A and 2B show pre-molding and post-molding positions ofencapsulant 30 during a transfer molding operation using a typical moldapparatus 24 comprising upper and lower mold halves 10 and 12, each moldhalf including a platen 14 or 16 with its associated chase 18 or 20.Heating elements 22 are employed in the platens 14, 16 to maintain anelevated and relatively uniform temperature in the runners 38, 40 andmold cavities 44 during the molding operation.

FIG. 3 is a top view showing one side of the transfer mold apparatus 24of FIGS. 2A and 2B. A die assembly 100 is placed in each mold cavity 44for encapsulation. In the transfer mold apparatus 24 shown, theencapsulant (resin mold compound) 30 flows into each mold cavity 44through the short end.

As illustrated in FIGS. 2A, 2B and 3, the operation of encapsulation isas follows. A heated pellet of resin mold compound or encapsulant 30 isdisposed beneath ram or plunger 32 in pot 34. The plunger 32 is forceddownwardly, melting the pellet and forcing the melted encapsulant 30down through sprue 36 and into primary runner 38. The melted encapsulant30 then travels to transversely oriented secondary runners 40 and acrossgates 42 into and through the mold cavities 44, flowing across the dieassemblies 100. Each die assembly 100 is within a mold cavity 44, andcomprises a die 102 with an attached lead frame 104. The die assemblies100 are typically disposed in strips so that a strip of, e.g., six leadframes 104 (see FIGS. 4A, 4B) may be cut and placed in and across thesix cavities 44 shown in FIG. 3.

Air in the primary runners 38, secondary runners 40 and mold cavities 44is vented to the atmosphere through vents 46 and 48. At the end of themolding operation, the encapsulant 30 is “packed” by application of ahigher pressure to eliminate voids and reduce non-uniformities of theencapsulant in the mold cavities 44. After molding, the encapsulated dieassemblies 60 are ejected from the cavities 44 by ejector pins 50, afterwhich they are post-cured at an elevated temperature to completecross-linking of the encapsulating thermoset resin, followed by otheroperations as known in the art and set forth in FIG. 1 by way ofexample.

It will be appreciated that other transfer molding apparatusconfigurations, as well as variations in details of the describedmethod, are known in the art. However, the instant invention isapplicable irrespective of the particular details of the transfermolding operation, and such alternate encapsulating procedures will bediscussed herein only to the extent that they may affect the invention.

The flow of encapsulant 30 in the mold cavities 44 is demonstrablynon-uniform. As depicted in FIGS. 4A, 4B, and 4C, the presence of thedie assembly 100 comprising a die 102 with lead frame 104 disposedacross the mid-section of a cavity 44 splits the viscous encapsulantflow front 54 into upper 56 and lower 58 components. Further, thepresence of the (relatively) large die 102 with its relatively lowertemperature in the middle of a cavity 44 permits the flow front 54 oneach side of the die 102 to advance ahead of the front which passes overand under the die 102. FIGS. 4A and 4B show two mold cavity encapsulantflow scenarios where, respectively, the lower flow front 58 and theupper flow front 56 lead the overall encapsulant flow front 54 in thecavity 44 containing the die assembly 100. FIG. 4C depicts the advanceof a typical flow front 54 from above, before and after a die 102 isencountered, the flow being depicted as time-separated instantaneousflow fronts 54A, 54B, 54C, 54D, 54E and 54F.

FIGS. 5A and 5B depict a packaged LOC assembly 60 formed by transfermolding, wherein hard filler particles 130 incorporated in theencapsulant become lodged between lead ends 122 and the underlying dieactive surfaces 116 of the die 102. The non-uniform flow characteristicsof the viscous encapsulant 30, as described above, may cause (inaddition to other phenomena such as wire sweep, which this inventiondoes not address) particles 130 to be more forcefully driven into thespaces 126 between the leads 112 and the die 102 and wedged or jammed inplace in low-clearance areas. As the encapsulant flow front 54 advances(see FIG. 4C) and the mold operation is completed by packing thecavities or spaces 126, pressure in substantially all portions of thecavities reaches hydrostatic. With prior art lead and adhesive LOCarrangements, the relative inflexibility of the tightly constrained(adhered) lead ends 122 maintains the point stresses of the particles130 trapped under the leads 112. These residual stresses are carriedforward in the fabrication process to post-cure and beyond. Whenmechanical, thermal, or electrical stresses attendant topost-encapsulation processing are added to the residual point stressesassociated with the lodged filler particles 130, cracking or perforationof the die coat 142 may occur, with the adverse effects previouslynoted.

It has been observed that filler particle-induced damage to a die activesurface 116 occurs more frequently in close proximity to the dielectricadhesive 114, where lead flexure potential is at its minimum.

To graphically illustrate the above description of particle lodging,FIG. 5A depicts a prior art packaged LOC assembly 60 wherein a singlelead 112 extends over a die 102, with a segment of dielectric adhesive114, in this instance a piece of polyimide tape, adhered to both thelead 112 and the active surface 116 of the die. As better illustrated inFIG. 5B, filler particle 130, which is part of the packaging material134, is lodged between lead 112 and die active surface 116. It is clearthat the lead end 122 is tightly constrained from movement by theinflexibility of the attachment of the lead end 122 to the die 102 byadhesive 114. Moreover, the relative closeness of the lead 112 to thedie active surface 116 and the inability of the lead 112 to flex orrelax to reduce stress occasioned by the presence of the filler particle130 may continue even after the encapsulant has reached hydrostaticbalance, such that the filler particle may become tightly lodged andwedged between the lead 112 and the die active surface 116.

The present invention described below provides relief from the particlecaused stresses in the die, as well as in the lead 112.

As shown in FIGS. 6A and 6B, a packaged LOC semiconductor device 70 ofthe invention comprises at least one lead end 122 of lead 112, the leadend extending over and spaced from die 102. For the sake of simplicity,a single bond wire 106 between a bond site 108 on a lead end 122 and abond pad 110 on the active surface 116 of die 102 is shown. Moretypically, each of a plurality of lead ends 122 is conductively attachedto a bond pad 110 by, e.g., a thin gold bond wire 106.

Alternatively, the conductive connections between the die 102 and thelead ends 122 may be by tape automated bonding (TAB), whereby the leadends are bonded directly to bond pads 110 by methods known in the art.

Each of the lead ends 122 is shown attached to the die 102 by anintervening layer 114 of dielectric adhesive, which may be, e.g., apolyimide film or adhesive tape such as KAPTON™ tape, a trademark ofDuPont.

The undersurface 128 of the lead end 122 is relatively hard whencompared to the die active surface 116 which is typically a glass.During encapsulation of the semiconductor device 70, particles 130 offiller material in the encapsulant are forced by the flow front ofencapsulant into the initial space or recess 126 between the lead end122 and the die active surface 116 along the outer edge 136 of the die102. Pressure of the hard particles 130 against the die active surface116 occasionally leads to damage of the die 102.

In accordance with this invention, such damage to the die 102 iseliminated or greatly reduced by a displaceable stress relief layer 140(also called a displaceable layer herein) which is attached to theundersurface 128 of the lead end 122 (see FIG. 6B). While the stressrelief layer 140 need only extend from the outer edge 138 of thedielectric adhesive 114 to the outer edge 136 of the die 102, it mayextend further inward to the inner ends 144 of the leads 112, and be anintervening layer between the lead undersurface 128 and the layer 114 ofdielectric adhesive. As will be described below, an advantage of suchextension is that when the stress relief layer 140 is formed ofelemental silver or similar metal/alloy, the bond between the lead ends122 and the dielectric adhesive layer 114 is believed to besignificantly enhanced, thus avoiding debonding which occasionallyoccurs in the prior art.

The stress relief layer 140 may also extend outwardly away from theouter edge 136 of the die 102 to ensure full coverage over the space orrecess 126. However, such extension is preferably only a short distance,particularly when the stress relief layer 140 comprises a costly metal.Thus, at one extreme, the stress relief layer 140 may cover theundersurface 128 of the lead end 122 adjacent the space or recess 126only. At the other extreme, the stress relief layer 140 may cover theentire undersurface 128 of the lead 112. Depending upon the particularapplication and the composition of the stress relief layer 140, apreferred embodiment typically includes a soft material layer coveringthe undersurface 128 adjacent both space or recess 126 and thedielectric adhesive layer 114.

As indicated above, the stress relief layer 140 comprises soft materialon the undersurface 128 of the lead end 122. The stress relief layer 140absorbs the energy of impinging filler particles 130. Thus, a particleor particles 130 forcibly entering the space 126 between the die 102 andthe lead end 122 will preferentially penetrate the soft material layer140.

The soft material of the stress relief layer 140 has preferentially lessthan about one-half the hardness value of the opposing surface, e.g.,die active surface 116, contacted by the hard filler particles 130.However, the stress relief layer 140 must have a hardness valuesufficient to prevent sloughing off of soft material therefrom.Typically, a hardness of about 0.05 to about 0.5 times that of the dieactive surface 116 is preferred. Expressed in another form, the Brinellhardness of the stress relief layer 140 will be less than about 40-50but at least about 5-10 Brinnel units.

It should be noted that the particular desired property of the stressrelief layer 140 is, in actuality, the ease with which it may bepenetrated by a hard object. Hardness, as measured by the Brinell orother scale, is a convenient and fairly accurate measure of thisproperty, but other properties which reflect penetrability may bealternatively specified.

The material of the stress relief layer 140 may be a soft metal such asessentially pure silver or other relatively inert metal, or an alloythereof with a generally low hardness, including pure metals such aspalladium and platinum and their alloys. The soft material must begenerally inert under manufacturing, encapsulating andpost-encapsulation conditions to avoid detrimental chemical reactionswith other chemical species during and following encapsulation. Becauseof this restriction, together with cost considerations, the number ofpossible metals which may find practical use as a stress relief layer140 is limited. However, silver has been found to be an excellentmaterial for the stress relief layer 140 in terms of hardness (about25-35 Brinell units), chemical resistance, and cost.

Furthermore, silver plating is typically used as an external protectivelayer over the, e.g., aluminum lead frame following its manufacture andprior to bonding it to the die 102. Ordinarily, most or all of thesilver is removed by, e.g., etching prior to die-to-lead frame bondingto enhance bonding and/or for silver recovery. Although silver may beleft on the wire bond sites to enhance electrical connection, a silveroxide layer may form on the silver, resulting in wire bonds of lowerstrength. Thus, in general practice, all of the silver coating may beremoved prior to die-to-lead frame bonding. The very thin layer ofsilver oxide on the silver plate does not significantly increase thehardness value for the purposes of this invention.

In the instant invention, the preferred method includes removal of all(or nearly all) silver from the lead frame 104 except that which is toform the stress relief layer 140. The thickness of the silver stressrelief layer 140 is generally about one to five microns, which issufficient to provide the opportunity for relatively deep penetration byfiller particles 130. Of course, the preferred thickness is the minimumwhich will provide the desired protection of the die 102.

The metal stress relief layer 140 may also be attached to theundersurface 128 of the lead end 122 by adhesive.

In an alternative embodiment, the soft material of the stress relieflayer 140 may be a polymer designed to have a low hardness, at leastduring the encapsulation process. Such polymers are known and includeepoxies, polyimides, acrylics, and silicones. The polymeric materialhardness prior to encapsulation is less than about one-half the hardnessof the die 102 or the coating thereon. The polymeric stress relief layer140 may subsequently harden further by, e.g., post-encapsulation thermaltreatment, but will have served its purpose in absorbing forces exertedby filler particles 130 during the encapsulant injection step. Thepreferential penetration of filler particles 130 into the stress relieflayer 140 protects the die surface from both immediate and subsequentdamage.

An additional advantage of using a stress relief layer 140 formed of asoft polymer is the additional electrical insulation provided thereby.Use of such a stress relief layer 140 may make possible a decrease inthe required thickness of the adhesive layer 114, e.g. dielectric tape.

The embodiment of the invention illustrated in the drawings of FIGS. 7Aand 7B differs from that of FIGS. 6A and 6B only in that a coating 148of adhesive dielectric material is applied to non-wirebonding areas ofthe active surface 116 of die 102 prior to attachment of the dielectricadhesive layer 114 thereto. While this coating 148 provides a degree ofprotection to the die active surface 116, it has been found that thehard filler particles 130 nevertheless may penetrate the coating or highforces may be transmitted through the coating and damage the diesurface. In accordance with this invention, a stress relief layer 140 isfixed on the undersurface 128 of the leads 112 and absorbs stresseswhich are otherwise placed upon and through the coating 148 to the dieactive surface 116. The stress relief layer 140 has a hardness value ofless than about one-half of the hardness value of the coating 148.

FIG. 8 shows a portion of a LOC semiconductor device 70 as describedabove in relation to FIGS. 7A and 7B, including die 102 with bond pads110 and a lead frame 104 with leads 112 extending over peripheralportions of the die. Conductive bond wires 106 are shown connecting bondpads 110 with bond sites 108 on the lead ends 122. The outer edge 136 ofthe die 102, the outer edge 146 of the coating 148, the outer edge 138of adhesive layer 114 overlying the coating 148, and the outer edge 124(first shown in FIG. 6B) of the stress relief layer 140 (on theundersurface of the leads 112) are shown as typically configured. Theportion of the leads 112 having a stress relief layer 140 on theundersurface thereof is shown as hatched in both FIGS. 8 and 9.

A stress relief layer 140 of the invention is useful for any deviceconfiguration in which at least one lead overlies, faces, and is spacedfrom the die surface to create a recess therebetween. Thus, FIG. 9depicts a different LOC semiconductor device 70 in which the leads 112Aoverlying the die 102 are in the central portion of the die, while leads112B not adhered to the die are connected by wires to peripheral bondpads 110B. Typically, leads 112A comprise bus bars. The outer edge 136of the die 102, the outer edge 146 of the coating 148, the outer edge138 of adhesive layer 114 overlying the coating 148, and the outer edge124 of the stress relief layer 140 (on the undersurface of the leads112) are shown as typically configured for this type of LOC die-to-leadframe attach.

In a test comparing the penetration and hardness of a polyimide layerand a silver plate sample, a pyramidal indenter was impinged onto thesample at a peak load of 5 grams. The polyimide layer was penetrated toabout 0.7 microns and the silver plate sample was penetrated to about1.1 microns. Calculation of microhardness by the Vickers methodindicated that the hardness of the polyimide surface was about 2.5 timesthat of the silver plate. By way of summary, the advantages of using astress relief layer of the invention include:

a. a reduction in process steps in manufacturing the lead frame;

b. a reduction in contamination matter being stripped from the leadframe and being subsequently redeposited during the process of strippingsilver from the backsurface of the lead frame;

c. permits the use of thinner polyimide tape for LOC packages;

d. permits thinner polyimide coatings;

e. may result in better adhesion between the compound/compressionlayer/lead frame interface, enhancing reliability; and

f. may offer improved adhesion between the lead frame and the die attachmaterial.

The present invention has been disclosed in terms of certain preferredembodiments as illustrated and described herein. However, those ofordinary skill in the art will recognize and appreciate that it is notso limited, and that various additions, deletions and modifications to,and combinations of, the disclosed embodiments may be effected withoutdeparting from the scope of the invention as hereinafter claimed.Further, the invention is not limited to a particular arrangement ofleads, or to a particular lead cross-section or configuration.

What is claimed is:
 1. An assembly comprising: a semiconductor die having an active surface; a lead frame including a plurality of lead members, at least a portion of said plurality of lead members having a lead end portion connected to a portion of said lead frame and having a free end portion extending over a portion of said active surface of said semiconductor die; and a deformable stress relief layer comprised of material attached to a portion of an undersurface of said free end portion of said at least a portion of said plurality of lead members.
 2. The assembly of claim 1, further comprising: a layer of material covering a portion of said active surface of said semiconductor die.
 3. The assembly of claim 2, wherein said deformable stress relief layer comprises a material having a hardness value less than a hardness value of said layer of material covering a portion of said active surface of said semiconductor die.
 4. The assembly of claim 1, wherein said semiconductor die comprises a leads-over-chip (LOC) die.
 5. The assembly of claim 2, wherein said deformable stress relief layer comprises a material having a Brinnel Hardness Value (BHV) of less than about one-half a BHV of said layer of material covering a portion of said active surface of said semiconductor die.
 6. The assembly of claim 2, wherein said deformable stress relief layer comprises a material having a Brinnel Hardness Value (BHV) of about 0.05 to 0.5 times a BHV of said layer of material covering a portion of said active surface of said semiconductor die.
 7. The assembly of claim 1, wherein portions of said active surface of said semiconductor die underlying at least two lead members of said plurality of lead members includes a coating of an insulative material, and said deformable stress relief layer of material comprises a material having a Brinnel Hardness Value (BHV) of about 0.05 to 0.5 times a BHV of said insulative material.
 8. The assembly of claim 1, wherein said deformable stress relief layer comprises a material having a Brinnel hardness value of about 5 to about
 100. 9. The assembly of claim 1, wherein said deformable stress relief layer comprises a material having a Brinnel hardness value of about 10 to about
 60. 10. The assembly of claim 1, wherein said deformable stress relief layer comprises a soft metal comprising one of silver, palladium and platinum.
 11. The assembly of claim 1, wherein said deformable stress relief layer comprises a soft alloy comprising at least one metal selected from the group consisting of silver, palladium, and platinum.
 12. The assembly of claim 1, wherein said deformable stress relief layer comprises a silver plating.
 13. The assembly of claim 1, wherein said deformable stress relief layer comprises an intervening layer between at least two lead members of said plurality of lead members and said active surface of said semiconductor die.
 14. The assembly of claim 1, wherein said deformable stress relief layer has a thickness of about one to about five microns.
 15. The assembly of claim 1, wherein said deformable stress relief layer comprises a polymer.
 16. The assembly of claim 15, wherein said deformable stress relief layer of polymer is configured to increase in hardness during post-encapsulation heat treatment.
 17. An assembly comprising: a semiconductor die having an active surface, a dielectric layer covering at least a portion of said active surface of said semiconductor die; a lead frame including a plurality of lead members, at least a portion of said plurality of lead members having a lead end portion connected to a portion of said lead frame and having a free end portion having, in turn, an undersurface facing extending over a portion of said active surface of said semiconductor die; and a deformable stress relief layer of material attached to a portion of said undersurface of said free end portion of each of said at least a portion of said plurality of lead members, said deformable stress relief layer of material comprising a material having a hardness value less than a hardness value of said dielectric layer covering said at least a portion of said active surface of said semiconductor die.
 18. The assembly of claim 17, wherein said semiconductor die comprises a leads-over-chip (LOC) die.
 19. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a material having a Brinnel Hardness Value (BHV) of less than about one-half a BHV of said dielectric layer covering said at least a portion of said active surface of said semiconductor die.
 20. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a material having a Brinnel Hardness Value (BHV) of about 0.05 to 0.5 times a BHV of said dielectric layer covering said at least a portion of said active surface of said semiconductor die.
 21. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a material having a Brinnel Hardness Value (BHV) of about 0.05 to 0.5 times a BHV of said dielectric layer.
 22. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a material having a Brinnel hardness value of about 5 to about
 100. 23. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a material having a Brinnel hardness value of about 10 to about
 60. 24. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a soft metal of at least one of the group consisting of silver, palladium, and platinum.
 25. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a soft alloy comprising at least one metal selected from the group consisting of silver, palladium, and platinum.
 26. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a layer of silver.
 27. The assembly of claim 17, wherein said deformable stress relief layer of material comprises an intervening layer between at least two lead members of said plurality of lead members and said dielectric layer covering said at least a portion of said active surface of said semiconductor die.
 28. The assembly of claim 17, wherein said deformable stress relief layer of material has a thickness of about one to about five microns.
 29. The assembly of claim 17, wherein said deformable stress relief layer of material comprises a polymer having a hardness less than said hardness value of said dielectric layer.
 30. The assembly of claim 29, wherein said polymeric deformable stress relief layer of material is configured to increase in hardness during post-encapsulation heat treatment.
 31. The assembly of claim 2, further comprising a layer of dielectric adhesive placed between and connecting at least two lead members of said plurality of lead members to said layer of material covering a portion of said active surface of said semiconductor die. 